LiCoO2 thin films were deposited on Au/Ti/SiO2/(polished)Si and Au/Ti/SiO2/(textured)Si using RF magnetron sputtering of lithium rich (10%) LiCoO2 target (sputter up geometry). In order to avoid the loss of lithium in the films, the target was fabricated by mixing pure commercial LiCoO2 (Sigma Aldrich, 99.99%) powder with Li2O (Sigma Aldrich, 99.99%) in required proportions and the target was made by cold pressing the powder mixture and was forwarded for sintering at 800 °C for 20 h. The size of the target was about 75 mm in diameter and 6 mm thick. The system was evacuated to a
Apoptosis Activator 2 pressure of 0.5 mPa with a turbo molecular pumping system backed by rotary pump. Prior to the LiCoO2 film formation, the target was pre-sputtered for 30 min at an RF power density of 2.2 Wcm−2 under Ar environment to remove the surface contamination. The LiCoO2 films were prepared at a power density of 3.3 Wcm−2 with a working pressure of 0.3 Pa (O2:Ar = 1:9) and the substrates were maintained at 300 °C. A rotary drive mechanism was used to rotate the substrate holder to obtain uniformity in the film thickness. The deposition time was maintained constant at 90 min. Throughout
polygenic inheritance paper, the as-grown LiCoO2 films on Au/Ti/SiO2/(polished)Si and the corresponding films annealed at 650 °C are termed as ‘sample A’ and ‘sample B’, respectively and the as-grown LiCoO2 films on Au/Ti/SiO2/(textured)Si are termed as ‘sample C’.
